Wave Front (Japanese)CAE Solution (Japanese)Particle-PULS > EXAMPLE
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Particle-PLUS has successfully analyzed vary models of plasma prosess. This page shows several application examples. Clicking each model tab, you can see the details of an analysis sample. (Sorry, several pages are written in Japanese.)

Sputtering – Magnetron Sputtering

Particle-PLUS can simulate a magnetron sputtering by use of a magnetic field analysis function. For example, the following observables are evaluatable: emission rate, energy and emission angle of sputtered particles, particle adsorption distribution, deposition rate and uniformity of film.

Capacitively Coupled Plasma (CCP)

Particle-PLUS can analyse plasma phenomena with considering matching circuits. The function enables to simulate the phenomena with more realistic model.

Chemical Vapor Deposition (CVD)

Particle-PLUS can simulate plasma CVD. A behavior of neutral particles, which contains radicals and excited species not only atoms and molecules, is computable by use of the neutral gas module and of generation distributions evaluated with plasma analysis.

Inductively Coupled Plasma (ICP)

Induction heating which is important for ICP model can be considered as well as dielectric heating used in CCP model.

Plasma Generation in ICP Model