Particle-PLUS/DL is an application to simulate various plasmas (such as magnetron, capacitive coupling, and inductive coupling) with surrogate models from deep learning. The simulation is enough quick to help parametric studies to optimize deposition and etching processes.
| Input Variables | |||
|---|---|---|---|
| Device type | Magnetron plasma |
CCP | ICP |
| Chambar size | (D) | ✓ | ✓ |
| DC electrodes | ✓ | ✗ | ✗ |
| RF electrodes | ✗ | ✓ | ✗ |
| Magnets | ✓ | ✗ | ✗ |
| Coils | ✗ | ✗ | ✓ |
| Gas pressure | (C) | (C) | (C) |
| Gas mixture | (C) | (C) | (C) |
| Output Variables | |||
|---|---|---|---|
| Device type | Magnetron plasma |
CCP | ICP |
| Electron density | ✓ | ✓ | ✓ |
| Ion flux | ✓ | ✓ | ✓ |
| Electron temperature | (C) | (C) | (C) |
Some surrogate models have already built by learning results of our CAE simulations using neural networks. Therefore users need not to prepare sample data for the machine learning. Particle-PLUS/DL including the models is released after verification.
Some parameters are limited in Particle-PLUS/DL for reasons of learned values. If you want to simulate more complex plasma systems (, for example, magnetron CCP, magnetron ICP, multi-frequency CCP, and mixture gas plasma), please consider following simulators.
